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장비현황

디스플레이실험실

HOME 장비현황 디스플레이실험실

LLO(Laser Lift Off)

Maker
  • AP systems(KORONATM LLO)
Application
  • First Linebeam LLO service provider for R&D
  • Laser Lift-off for Flexible display&devices
  • Laser treatment for material modification
  • Laser exposure tool
  • 308 nm XeCl eximer laser
  • Max. energy density 600mJ/cm2
Substrate
  • Quartz Wafer(200 x 200 mm2, 6 inch, Piece)
  • Glass Wafer(200 x 200 mm2, 6 inch, Piece)
  • Silicon Wafer(not available for LLO), (200 x 200 mm2, 6 inch, Piece)
LLO

플렉서블 방지막 제조 장비

Maker
  • CN1&UNIJET
Application
  • 무기/유기 복합 구조의 플렉서블 방지막 제작 : 클러스터 타입 OLED 증착기와 연결된 ALD와 Inkjet-Printing 모듈
  • 무기 박막(ALD 모듈) : Al2O3 thin film
  • 유기 박막(Inkjet-Printing 모듈) : Polymer film
Substrate
  • Silicon Wafer(8 inch, Piece)
  • Quartz Wafer(8 inch, Piece)
  • Glass(8 inch, Piece)
플렉서블 방지막 제조 장비

PECVD

Maker
  • TES
Application
  • SiO2, SiNx, a-Si deposition
  • Deposition temp 200~380℃
Substrate
  • Silicon Wafer(100 x 100 mm2, 6 inch, Piece)
  • Quartz Wafer(100 x 100 mm2, 6 inch, Piece)
  • Glass Wafer(100 x 100 mm2, 6 inch, Piece)
PECVD

Sputter

Stepper
  • 하나진공기술
Application
  • ITO deposition
  • Sheet resistnace 30 ohm/sq
Substrate
  • Silicon Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
  • Quartz Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
  • Glass Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
Sputter