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장비현황 디스플레이실험실
LLO(Laser Lift Off)
Maker
Application
- First Linebeam LLO service provider for R&D
- Laser Lift-off for Flexible display&devices
- Laser treatment for material modification
- Laser exposure tool
- 308 nm XeCl eximer laser
- Max. energy density 600mJ/cm2
Substrate
- Quartz Wafer(200 x 200 mm2, 6 inch, Piece)
- Glass Wafer(200 x 200 mm2, 6 inch, Piece)
- Silicon Wafer(not available for LLO), (200 x 200 mm2, 6 inch, Piece)
플렉서블 방지막 제조 장비
Maker
Application
- 무기/유기 복합 구조의 플렉서블 방지막 제작 : 클러스터 타입 OLED 증착기와 연결된 ALD와 Inkjet-Printing 모듈
- 무기 박막(ALD 모듈) : Al2O3 thin film
- 유기 박막(Inkjet-Printing 모듈) : Polymer film
Substrate
- Silicon Wafer(8 inch, Piece)
- Quartz Wafer(8 inch, Piece)
- Glass(8 inch, Piece)
PECVD
Maker
Application
- SiO2, SiNx, a-Si deposition
- Deposition temp 200~380℃
Substrate
- Silicon Wafer(100 x 100 mm2, 6 inch, Piece)
- Quartz Wafer(100 x 100 mm2, 6 inch, Piece)
- Glass Wafer(100 x 100 mm2, 6 inch, Piece)
Sputter
Stepper
Application
- ITO deposition
- Sheet resistnace 30 ohm/sq
Substrate
- Silicon Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
- Quartz Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
- Glass Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)