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Display Laboratory

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LLO(Laser Lift Off)

Maker
  • AP systems(KORONATM LLO)
Application
  • First Linebeam LLO service provider for R&D
  • Laser Lift-off for Flexible display&devices
  • Laser treatment for material modification
  • Laser exposure tool
  • 308 nm XeCl eximer laser
  • Max. energy density 600mJ/cm2
Substrate
  • Quartz Wafer(200 x 200 mm2, 6 inch, Piece)
  • Glass Wafer(200 x 200 mm2, 6 inch, Piece)
  • Silicon Wafer(not available for LLO), (200 x 200 mm2, 6 inch, Piece)
LLO

Flexible Barrier Manufacturing Equipment

Maker
  • CN1&UNIJET
Application
  • Manufacture of flexible barriers for composite organic/inorganic structures: ALD and Inkjet-Printing modules connected to a cluster-type OLED deposition system.
  • Inorganic film (ALD module): Al2O3 thin film
  • Organic film (Inkjet-Printing module): Polymer film
Substrate
  • Silicon Wafer(8 inch, Piece)
  • Quartz Wafer(8 inch, Piece)
  • Glass(8 inch, Piece)
Flexible Barrier Manufacturing Equipment

PECVD

Maker
  • TES
Application
  • SiO2, SiNx, a-Si deposition
  • Deposition temp 200~380℃
Substrate
  • Silicon Wafer(100 x 100 mm2, 6 inch, Piece)
  • Quartz Wafer(100 x 100 mm2, 6 inch, Piece)
  • Glass Wafer(100 x 100 mm2, 6 inch, Piece)
PECVD

Sputter

Maker
  • Hana Vacuum Technology
Application
  • ITO deposition
  • Sheet resistnace 30 ohm/sq
Substrate
  • Silicon Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
  • Quartz Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
  • Glass Wafer(200 x 200 mm2, 100 x 100 mm2, 6 inch, Piece)
Sputter