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About the Laboratory

History

HOME About the Laboratory History
1999 ~ 2018
  1. 2016 ~ 2018
    • Opened the Flexible Electronic Materials Center (FEMC)
  2. 2008 ~ 2009
    • Converted the 6-inch batch process in the Silicon Laboratory on the G floor of Building 4
  3. 2004 ~ 2008
    • Established the Nano Laboratory on the G floor of Building 4
  4. 1999 ~ 2002
    • Created a comprehensive fabrication environment for the Compound Semiconductor Laboratory on the G floor of Building 4 (funded by memory technology fees and MIC Cyber Foundry research funds)
1987 ~ 1998
  1. 1996 ~ 1998
    • Established around 230-square-meter R&D Laboratory on the ground floor of Building 4 (funded by MIC, KT, joint ministry research funds, and memory technology fees)
  2. 1993 ~ 1995
    • Added around 60-square-meter extension to the Compound Semiconductor Laboratory on the G floor of Building 4 (funded by MIC and joint ministry research funds)
  3. 1991 ~ 1992
    • Established around 350-square-meter Compound Semiconductor Laboratory on the G floor and around 250-square-meter Physical Analysis Laboratory on the first floor of Building 4 (funded by MIC, KT, joint ministry research funds, and OECF loans)
  4. 1987 ~ 1990
    • Established around 770-square-meter Silicon Laboratory on the G floor of Building 4 (funded by KT, joint ministry research funds, and a 1989 special foreign currency loan)